Antenna Effects | Physical Verification | Back To Basics

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Back To Basics

Back To Basics

Күн бұрын

Hello Everyone,
This video explains the antenna effects that occur during the manufacturing process. The most common methods to resolve antenna violations are also clearly described in the video.
Find all my previous videos in the links given below:
A playlist containing videos on Physical Only Cells :
/ @backtobasics5602
Temperature Inversion:
• Temperature Inversion ...
Working of a MOSFET:
• Working of a MOSFET
LATCH-UP IN CMOS CIRCUITS
• LATCH-UP IN CMOS CIRCUITS
#AntennaEffects #PhysicalDesign #BackToBasics

Пікірлер: 86
@nesara6563
@nesara6563 4 жыл бұрын
it's really helpful and you have explained in depth thank you so much please upload more videos on physical design
@sohamlakhote9822
@sohamlakhote9822 4 жыл бұрын
One of the best explanations of antenna effect that I have ever seen. Thank you so much mam!!
@balajibethamcharla998
@balajibethamcharla998 4 жыл бұрын
All my doubts are cleared by this... Thank you
@AunirbanDutta1
@AunirbanDutta1 3 жыл бұрын
Very well explained.I had used metal jogging and diode insertion techniques to fix antenna violation drcs but didnt know the reason for doing so.This video helped me understand it,thanks for the upload.
@maheshbabu1729
@maheshbabu1729 2 жыл бұрын
Best explanation I have seen .. thank you! Great job !!!
@user-tw7dx9lv4l
@user-tw7dx9lv4l 2 жыл бұрын
Thanks a lot for the explanation! You're an angel!
@VijayRaghava-ck3iq
@VijayRaghava-ck3iq 2 жыл бұрын
Thank u for explaining in detail .... useful for my interview
@binduls7127
@binduls7127 3 жыл бұрын
Such a clear explanation. Very useful..big thumbs up
@jayreddy5124
@jayreddy5124 3 жыл бұрын
Perfect and clean explanation...even a laymen can understand without any knowledge
@backtobasics5602
@backtobasics5602 3 жыл бұрын
Thanks 😊
@prasadpaturu9841
@prasadpaturu9841 4 жыл бұрын
It is very useful, please update the double pattering and triple patterning
@srujannama4676
@srujannama4676 4 жыл бұрын
Good Information. Thanks for sharing your knowledge.
@vinayn4767
@vinayn4767 3 ай бұрын
now i clearly understood thank mam
@pravallikachebolu4090
@pravallikachebolu4090 2 жыл бұрын
Very clean explanation, thank you
@AlejandroHernandez-xi4vl
@AlejandroHernandez-xi4vl 2 жыл бұрын
Really useful video, Thank you!
@bolakamadhu9222
@bolakamadhu9222 2 жыл бұрын
Thank you so much madam....very good and clarity explanation 👍🏻
@dineshm5384
@dineshm5384 3 жыл бұрын
Nice explanation. Thank you very much.
@MsSamuel143
@MsSamuel143 4 жыл бұрын
Awesome Madam. Very Useful information
@user-qs3ih3ll5f
@user-qs3ih3ll5f 9 ай бұрын
Very clear, thanks!
@harshithas5575
@harshithas5575 2 жыл бұрын
Great explanation!
@wonseokchoi3938
@wonseokchoi3938 3 жыл бұрын
Thanks. it's really clear
@ankamanirudh8837
@ankamanirudh8837 3 жыл бұрын
Thnak you mam very well clearly explained
@user-on6bt1kz9m
@user-on6bt1kz9m 6 ай бұрын
best explantions i ever seen
@rishabhkumarsoni1240
@rishabhkumarsoni1240 2 жыл бұрын
Great Explaination mam
@chirnjibsahoo2418
@chirnjibsahoo2418 4 жыл бұрын
nice video,very useful
@94D33M
@94D33M Жыл бұрын
Hi Madam, is there a 3rd way of preventing antenna violation when there is no metal jump and diode available, but we have a dummy mosfet to increase the gate area?
@hemajeyalakshmi9106
@hemajeyalakshmi9106 2 жыл бұрын
Amazing!!!
@nagireddymallikarjunareddy9624
@nagireddymallikarjunareddy9624 4 жыл бұрын
Good explanation..
@sandychauhan3555
@sandychauhan3555 3 жыл бұрын
Very good explanation one request can u make an video on physical verification checks like perc softcheck , lvs, dfyd, vrc, pattern matching , erc
@shrutichavanaik5782
@shrutichavanaik5782 4 ай бұрын
Thank you so much
@NitishKumar-yc8oy
@NitishKumar-yc8oy 4 жыл бұрын
Woow, thank you so much for such a wonderful explanation. Can you please explain how come the charges are getting accumulated only in dry etching process? Also I have another doubt, how the dry plasma etching deposit only one kind of charge as the plasma gas is neutral in nature i.e. both the electrons and positive ions are equal in number.
@demetriosioannides1937
@demetriosioannides1937 4 жыл бұрын
Great video but you should also include CMP as a charge inducing mechanism.
@ashokverma63
@ashokverma63 9 ай бұрын
Amazing 😍😍
@venkateshwararao5060
@venkateshwararao5060 4 жыл бұрын
Hi Mam, A heartful thanks to you. It is really helpful and by seeing this video and with your explanation, it has boosted my confidence on this topic. If possible, Request you for more videos on DRC, ERC, LVS and on power-planning like estimating no. of strips, the spacing between them etc. All the Best for your upcoming videos Thank you
@backtobasics5602
@backtobasics5602 4 жыл бұрын
I am glad that you liked it :) I will make the videos on suggested topics in future. Thanks.
@marlapavankalyan143
@marlapavankalyan143 Жыл бұрын
Good information mam
@saint2091
@saint2091 3 жыл бұрын
Indeed very useful info. Can you recommend a book for this topic?
@avinashvinith84
@avinashvinith84 4 жыл бұрын
Hi Mam, according to this video, in diode insertion method , in both the forward and reverse biased diodes, the current is not reaching the gate, can we get a clear explaination regarding this.
@rahultiwari6464
@rahultiwari6464 4 жыл бұрын
very usefull
@vbag42
@vbag42 Жыл бұрын
Can you please explain how we can control the selectivity of plasma etching
@aswinrmohan5727
@aswinrmohan5727 2 жыл бұрын
Superb explanation. I just have one doubt though - for another example, where there is a path from M3 to gate oxide and also to the output. Like there is no need for M4 metal for that path. In that case, why would the charge get discharged through gate oxide alone and not the output? Why not damage the output?
@avinashvinith84
@avinashvinith84 4 жыл бұрын
Hello Mam, can you make a video on clock Gating, setup time and hold time between latches and latch to flip flop, path based and graph based analysis. Thank you
@vashuyadav4403
@vashuyadav4403 4 жыл бұрын
Great explanation but as you have shown that the exposed part during etching will be etched out. So while doing plasma etching the charges will be bombarded on the metal and that part will get etched out so how does it will cause the problem when it is already etched out.
@MinhTriVo-vt8lc
@MinhTriVo-vt8lc 3 жыл бұрын
Thanks
@Engineer884
@Engineer884 8 ай бұрын
you said that in case of forward bias diode, the current will flow through the diode and not through the gate, but Gate current is already zero, so what's the issue??
@anantsingh12300
@anantsingh12300 4 жыл бұрын
Nowadays mostly designs operate at .75 v to 1 v..and Zener diode is having breakdown voltage of 6 v.. Then based on what criteria charge flux is discharged through diode. How do we know what is the cutt off voltage for charge accumulation to destroy gate oxide??
@narendrapratapsharma2287
@narendrapratapsharma2287 3 жыл бұрын
Can you tell what is difference between metal 1 metal 2 and so on?
@kajalbhardwaj6808
@kajalbhardwaj6808 2 жыл бұрын
Hey do more videos ..
@shivakumarnakka1546
@shivakumarnakka1546 4 жыл бұрын
it is very useful and please upload more videos on physical verification
@backtobasics5602
@backtobasics5602 4 жыл бұрын
Sure.
@shivakumarnakka1546
@shivakumarnakka1546 4 жыл бұрын
@@backtobasics5602 if you have any pdf file on physical verification just forward to this mail shivakumarnakka49@gmail.com... Please!!!!!
@nishatt4722
@nishatt4722 4 ай бұрын
Why antenna does not occur near drain or source
@vinaymeneddi4308
@vinaymeneddi4308 4 жыл бұрын
That means that whenever there is high charge in metal it will be break down reverse bias diode and that total charge will be discharged that's u r saying,then that diode will also discharge the our desired Voltage across gate?
@backtobasics5602
@backtobasics5602 4 жыл бұрын
When the potential on metal during etching reaches breakdown potential of diode, charge will discharge through reverse biased diode. It will not affect desired voltage because the diode is reversed biased. Normal operation of circuits happens at very low voltage, at that voltage reverse biase diode will not turn on. So normal operation of circuit will not be affected.
@aparnavalluri8667
@aparnavalluri8667 4 жыл бұрын
Pls upload more vedios on physical design
@backtobasics5602
@backtobasics5602 4 жыл бұрын
I will try my best to upload videos more frequently.
@hoonkoolee2080
@hoonkoolee2080 4 жыл бұрын
Good
@backtobasics5602
@backtobasics5602 4 жыл бұрын
Thanks :)
@bhanuprakash3274
@bhanuprakash3274 Жыл бұрын
why we use upper metal m4, why cant m2 ?? there is no discharge path for already manufactured m3 metal( still the charges are present in m3). once m4 manufactured there is a connection right similar to m2 connection
@bhanuprakash3274
@bhanuprakash3274 Жыл бұрын
and there are two other ways , one we can use dummy load insertion other change routing order to top metal since top metal as less antenna issues
@saikiransiripuram8747
@saikiransiripuram8747 3 жыл бұрын
Etching is done before metal4 fabrication? in this video?mam plz explain
@vbag42
@vbag42 Жыл бұрын
Etching is done during fabrication at almost every step again and again
@annmaryjoseph2882
@annmaryjoseph2882 4 жыл бұрын
Good information. Can you please upload video on ECOs and ESD ?
@backtobasics5602
@backtobasics5602 4 жыл бұрын
Will try my best to upload more videos.
@annmaryjoseph2882
@annmaryjoseph2882 4 жыл бұрын
@@backtobasics5602 I love your explanation.It is so simple and very easy to understand.just one time listening is enough to grasp the topic.I got to know many basic concepts and clear my doubts from your videos..Much much better than the institute where I did training in PD.
@backtobasics5602
@backtobasics5602 4 жыл бұрын
I am really glad that you like my videos :)
@mymemories8934
@mymemories8934 4 жыл бұрын
Most of people in industry saying that jumpers/jogging can also use lower metals as well. Is it helps?? If yes, how it works??
@backtobasics5602
@backtobasics5602 4 жыл бұрын
According to my knowledge.. Jumper in lower metal layer wont help antenna.
@satishgupta0709
@satishgupta0709 4 жыл бұрын
Maan if there is charge accumulated in the metal 3 layer and if we use jumper of higher metal layer, since metal 4 is not yet formed but metal 3 is divided and it wont reach gate oxide, but then also metal 3 will have charge and it will be accumulated in metal 3 layer.And it metal 4 layer jumper is formed it will discharge through it,then how jumper will save gateoxide? Please help
@backtobasics5602
@backtobasics5602 4 жыл бұрын
Once metal 3 is etched.. The charge will not be there on metal 3 anymore. Charge is there only till metal is in plasma.
@suniljagadal9630
@suniljagadal9630 4 жыл бұрын
Seems there are methods to discharge the accumulated charge of m3 before M4 is being fabricated...
@aparnavalluri8667
@aparnavalluri8667 4 жыл бұрын
When we use partial blockages? Pls reply me
@annmaryjoseph2882
@annmaryjoseph2882 4 жыл бұрын
Partial blockage are used to restrict the % of utilisation.for eg we use partial placemnt blockage with % 50%,then only 50% of that area is occupied by std cells.remaining will be placed outside the blockage. The main aim of partial blockage is to reduce congestion effects
@aparnavalluri8667
@aparnavalluri8667 4 жыл бұрын
You are pd engineer
@annmaryjoseph2882
@annmaryjoseph2882 4 жыл бұрын
@@aparnavalluri8667 yes
@aparnavalluri8667
@aparnavalluri8667 4 жыл бұрын
I have lot of doubts in pd will u pls solve
@annmaryjoseph2882
@annmaryjoseph2882 4 жыл бұрын
@@aparnavalluri8667 yaa sure.whatevr I knw I can help you with dat 🙂
@kandrashilpasree114
@kandrashilpasree114 3 жыл бұрын
Hello mam.. Very nice explanation But I have a one doubt One side of that long metal is connected to gate and another is connected to some drain sharing then what will happend Is Antenna affect is coming??
@mohangowda4282
@mohangowda4282 3 жыл бұрын
@@kandrashilpasree114 I am re-commenting : yes , we have antenna violation , on local net which includes driver (drain)and receiver (gate), in this case we add diode near to receiver (to protect gate)
@kandrashilpasree114
@kandrashilpasree114 3 жыл бұрын
@@mohangowda4282 okay
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